激光与光电子学进展, 2021, 58 (3): 0314002, 网络出版: 2021-03-12
对基于时空干涉的空间整形的畸变与光强校正
Distortion and Light Intensity Correction for Spatiotemporal-Interference-Based Spatial Shaping
激光器 飞秒激光整形 时空干涉 畸变校正 平顶光整形 微纳加工 lasers femtosecond laser shaping spatiotemporal interference distortion correction flat-top light shaping micro-nano fabrication
摘要
时空干涉的飞秒激光空间整形技术是一种新型图形化激光加工方法,相比传统技术更加简单灵活并有更高的效率。然而此技术中的缩束系统造成的成像畸变严重影响了加工的准确性。本文模拟并分析了该系统中的畸变现象,利用空间光调制器的相位全息图补偿畸变引起的空间光场的位置变化和光强分布不均。此方法可使曝光处干涉图案的最大偏移量由10.66 μm趋近于0,在实验中将相对最大偏差由60.42%降至8%以下,并使该处二维光强分布趋近于平顶光。该算法降低了时空干涉的飞秒激光空间整形技术对于缩束成像系统的设计需求,节省了成本与时间。基于以上方法,在不锈钢表面拼接加工出了1.5 mm×1.5 mm的具备多级别防伪能力的二维码图案。
Abstract
As a kind of new graphic laser processing method, the femtosecond laser spacing technology, based on the spatiotemporal interference, is more easy, flexible and efficient than traditional ones. However, the imaging distortion introduced by the shrink-beam system has huge influence on the accuracy of processing. This work simulates and analyzes the distortion of the system, and uses the phase hologram of the spatial light modulator to compensate the position change of the spatial light field and uneven light intensity distribution caused by the distortion. The method can make the maximum deviation of the interference pattern near the exposure point approach 0 from 10.66 μm, the relative maximum deviation reduces from 60.42% to under 8% and the two-dimension light intensity distribution get close to flat-top. This algorithm reduces the design requirements of the femtosecond laser space shaping technology of space-time interference for the reduced beam imaging system, and saves cost and time. Based on the above methods, a 1.5 mm×1.5 mm quick response code pattern with multi-level anti-counterfeiting capability was spliced and processed on the stainless steel surface.
林御寒, 石惠, 贾天卿. 对基于时空干涉的空间整形的畸变与光强校正[J]. 激光与光电子学进展, 2021, 58(3): 0314002. Lin Yuhan, Shi Hui, Jia Tianqing. Distortion and Light Intensity Correction for Spatiotemporal-Interference-Based Spatial Shaping[J]. Laser & Optoelectronics Progress, 2021, 58(3): 0314002.