中国激光, 2014, 41 (7): 0707001, 网络出版: 2014-06-24
不同基底上SiO2薄膜红外波段的水吸收特性
Substrate Effects on the Water Absorption of Infrared SiO2 Film
薄膜 SiO2薄膜 水吸收特性 红外漫反射光谱 原子力量微镜分析 thin films SiO2 thin films water absorption in-situ diffuse reflectrance infrared Fourier tran atomic force microscope
摘要
研究了SiO2薄膜的微结构与水吸收特性之间的内在联系,分别在Si、Al2O3和JGS3基底应用电子束蒸发沉积SiO2薄膜。实验用原位傅里叶红外漫反射光谱(in-situ DRIFTS)检测薄膜水吸收特性,并结合原子力显微镜(AFM)进行微结构分析。实验发现:常温吸附状态时,薄膜表面的孔隙数目越多,SiO2薄膜水吸收量越大;薄膜表面粗糙度影响薄膜水吸收特性;升温过程薄膜出现退吸附现象以及蓝移效应。
Abstract
SiO2 films are deposited on Al2O3、 JGS3 and Si substrate by electron beam technology. In-situ diffuse reflectance infrared Fourier transform spectroscopy (DRIFTS) and atomic force microscope (AFM) tests are used to demonstrate the relationship between the water absorption and the microstructure of the SiO2 films. The in-situ DRIFTS and AFM results indicate that the water absorption is enhanced while number of pores on the film surface increased. The peaks of absorption center is determined by the surface roughness of the films. Blue-shifted of absorption are evidently observed while the temperature increased from 25 ℃ to 220 ℃.
李豪, 易葵, 崔云, 范正修. 不同基底上SiO2薄膜红外波段的水吸收特性[J]. 中国激光, 2014, 41(7): 0707001. Li Hao, Yi Kui, Cui Yun, Fan Zhengxiu. Substrate Effects on the Water Absorption of Infrared SiO2 Film[J]. Chinese Journal of Lasers, 2014, 41(7): 0707001.