为探讨He-Ne激光对紫外线-B(UV-B)辐射损伤修复途径，采用He-Ne激光辐照(5 mW·mm-2)进行照射，对增强UV-B(13.08 kJ·m-2·d-1)辐射下水稻幼苗的叶绿素含量、核酮糖-1，5-二磷酸羧化酶/加氧酶(rubisco)亚基含量及反映植物光系统II(PSII)的荧光参数值进行测定。结果表明，经UV-B处理后，水稻叶片中的叶绿素含量、rubisco亚基含量及荧光参数值(除qN以外)低于对照组(CK)，差异显著(P<0.05)，其中荧光参数Fv/Fm对环境胁迫反映最为敏感；而单独He-Ne激光(L)处理组均高于对照组(CK)，差异不显著(P>0.05)；经He-Ne激光和UV-B复合组(BL)均高于UV-B处理组，低于对照组，差异显著(P<0.05)；说明UV-B辐射对水稻幼苗的光合系统有损伤作用，而一定剂量的He-Ne激光可以提高水稻的光合能力，表明He-Ne激光对增强UV-B辐射造成的损伤具有一定修复作用。

In order to investigate the influence of photosynthesis on rice flag under enhanced UV-B radiation and He-Ne laser. He-Ne laser (5 mW·mm-2) irradiation and enhanced UV-B (13.08 kJ·m-2·d-1) radiation were used, the chlorophyll content and Rubisco of rice seedling leaves, chlorophyll fluorescence parameters about plant photosystem II (PSII) are measured. The results show that, after UV-B treatment, the chlorophyll content in rice leaves, and fluorescence parameters (other than qN) is lower than the control group (CK) and has significant differences (P<0.05). The fluorescence parameter photochemical quantum yield (Fv/Fm) is the most sensitive to environmental stress reflection. In indicator group treated by He-Ne laser (L), the chlorophyll content and Rubisco in rice leaves are higher than the control group (CK) (P>0.05), fluorescence parameters does not change significantly (P>0.05). Compared with the control group (P<0.05), groups treated with He-Ne laser and UV-B, chlorophyll content, rubisco, and fluorescence parameters (except for qN ) of the rice leaves are higher than UV-B treated group. UV-B radiation on rice seedlings has injury to PSII, and a certain dose of He-Ne laser can improve the photosynthetic efficiency of rice. He-Ne laser can repair damage of enhanced UV-B to rice.