本文对在过渡金属铁、镍电极表面制备得到的γ-氨丙基三甲氧基硅烷(γ-APS)膜进行了研究.实验中对硅烷膜用X-射线光电子能谱(XPS)、现场表面增强拉曼散射光谱(SERS)和原子力显微镜(AFM)进行了表征.X-射线光电子能谱(XPS)的结果发现存在两个N1s峰,表明γ-APS膜中的氨基有两种存在方式:自由氨基和质子化氨基.实验中还发现现场表面增强拉曼散射光谱(SERS)是研究金属/γ-APS系中界面层结构非常有效的手段,SERS结果表明硅醇羟基和氨基发生了竞争吸附,且γ-APS分子在外加电位等条件的影响下吸附状态会发生一定变化.原子力显微镜(AFM)的表征结果在微观上显示电极表面的γ-APS膜上形成了一种较规则的微孔结构,这种结构可能与基底的性质有关.

The films of γaminopropyltrimethoxysilane (γAPS) prepared on transition metal(iron and nickel electrode) surfaces were studied. The silane films were characterized by Xray photoelectron spectroscopy (XPS), insitu Surfaceenhanced Raman spectroscopy (SERS), atom force microscopy (AFM). XPS results of γAPS modified electrodes showed the presence of two nitrogen binding energy peaks indicating the presence of the amine in two different states, the free amine and the protonated state. It has been found that the insitu surfaceenhanced Raman spectroscopy are useful for diagnosing the structure of the γAPS/metal interface. Results of SERS indicated that the silanol and amino groups adsorbed competitively on the metal surfaces. At the same time, the electrode potential has great influence on the nature of adsorption of these head groups. The films of γAPS on electrode surfaces was characterized by atom force microscopy and showed a kind of regular porous structure on the microscopic scale, it may due to the roughness of the elect rode surfaces.