激光与光电子学进展, 2005, 42 (1): 22, 网络出版: 2006-06-01
薄膜应力研究 
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A Review of Study of Stress in Thin Films
摘要
综述了近几年薄膜应力研究的重点及新进展,探讨了薄膜应力研究的发展方向。
Abstract
The research emphasis and the latest advance of stress study in thin films are reviewed, and the dominant direction of the study of thin solid film stress is discussed.
邵淑英, 范正修, 范瑞瑛, 邵建达. 薄膜应力研究[J]. 激光与光电子学进展, 2005, 42(1): 22. 邵淑英, 范正修, 范瑞瑛, 邵建达. A Review of Study of Stress in Thin Films[J]. Laser & Optoelectronics Progress, 2005, 42(1): 22.
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