中国激光, 2005, 32 (2): 236, 网络出版: 2006-06-01  

光折变多重全息图分批热固定的光擦除特性

Optical Erasure Characteristic of Batch Thermal Fixing for Photorefractive Multiplexing Holograms
作者单位
北京工业大学应用数理学院, 北京 100022
摘要
研究光折变多重全息图分批热固定方法,依据热固定的基本理论模型研究离子补偿后的全息电子光栅在分批记录和定影过程中的光擦除特点。引入批间光擦除时间常数对多重全息图分批热固定的批间擦除特性进行定量描述,给出了测量批间光擦除时间常数的实验方法,并测得实际晶体的批间光擦除时间常数。研究结果表明,被记录光激发的已定影全息图的获陷电子对其离子光栅的屏蔽作用,使得多重全息光栅的各批间光擦除时间常数τF远大于每批内光栅间的擦除时间常数τE,实验结果与理论预期一致。证实了批间光擦除时间常数与批内光擦除时间常数的差异是采用分批存储热固定技术高效存储热固定高密度全息图的基本依据。
Abstract
The batch thermal fixing scheme for multiplexed holograms is investigated. The dynamic behaviors of both electrons and ions in the case of light illumination and elevated temperature are theoretically analyzed, and hereby the optical erasure effect of subsequent recording light on ion-compensated electronic gratings is presented. The inter-batch optical erasure time constant, τF, is theoretically introduced, to evaluate the optical erasure to electronic gratings compensated by ions. The special experiment for measuring the parameter τF is designed and performed. The experimental result shows that inter-batch optical erasure time constant, τF, is much longer than intra-batch optical erasure time constant, τE, which agrees well with the theoretical prediction. Owing to the difference between τF and τE, the batch thermal fixing is an effective technique to achieve nonvolatile high-capability holographic storage.

江竹青, 陶世荃, 袁韦华, 刘国庆, 丁晓红. 光折变多重全息图分批热固定的光擦除特性[J]. 中国激光, 2005, 32(2): 236. 江竹青, 陶世荃, 袁韦华, 刘国庆, 丁晓红. Optical Erasure Characteristic of Batch Thermal Fixing for Photorefractive Multiplexing Holograms[J]. Chinese Journal of Lasers, 2005, 32(2): 236.

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