中国激光, 2003, 30 (1): 22, 网络出版: 2006-06-27
亚稳态氖原子光刻的实验研究
Experimental Study on Metastable-neon Atom Lithography
摘要
用亚稳态氖原子束进行了原子光刻实验。用栅网作掩膜,以扩散泵油的有机分子在高能亚稳态氖原子作用下所生成的碳膜作抗蚀剂,在硅片上刻蚀出分辨率为2 μm的微结构,为进一步的纳米级原子光刻技术的研究打下了基础。
Abstract
The atomic lithography experiments were carried out by use of a metastable neon atomic beam. Metallic meshes were used as masks, and the carbon films produced from the organic molecules of diffusion pump oil, which were adsorbed on the surface of wafers and exposed to the high energy metastable neon atomic beams. The microstructures on the silicon wafers with the resolution of microns were obtained.
霍芸生, 蔡惟泉, 曾庆林, 鄢和明, 王育竹. 亚稳态氖原子光刻的实验研究[J]. 中国激光, 2003, 30(1): 22. 霍芸生, 蔡惟泉, 曾庆林, 鄢和明, 王育竹. Experimental Study on Metastable-neon Atom Lithography[J]. Chinese Journal of Lasers, 2003, 30(1): 22.