中国激光, 2002, 29 (1): 25, 网络出版: 2006-08-08
193 nm和308 nm准分子激光对聚合物刻蚀特性的比较
Comparison of Etching Characteristics of Polymers by 193 nm and 308 nm Excimer
摘要
描述了两种典型准分子激光(XeCl:308nm,30 ns和ArF:193 nm,17 ns)对三种常用聚合物PC,PI和PMMA的刻蚀实验研究.着重讨论准分子激光对聚合物的刻蚀机制,并比较了这两种激光对三种聚合物的刻蚀性能.
Abstract
In this paper, experimental study of two kinds of typical excimer lasers (XeCl: 308 nm, 30 ns and ArF: 193 nm,17 ns) etching PC, PI, and PMMA is described. The mechanism of excimer laser etching polymer is mainly discussed, and the performances of the two kinds of excimer lasers etching the polymers are compared.
章琳, 楼祺洪, 魏运荣, 董景星, 李铁军, 黄峰. 193 nm和308 nm准分子激光对聚合物刻蚀特性的比较[J]. 中国激光, 2002, 29(1): 25. 章琳, 楼祺洪, 魏运荣, 董景星, 李铁军, 黄峰. Comparison of Etching Characteristics of Polymers by 193 nm and 308 nm Excimer[J]. Chinese Journal of Lasers, 2002, 29(1): 25.
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