中国激光, 2002, 29 (1): 40, 网络出版: 2006-08-08
原子光刻用亚稳态氖原子束源的研究
Study on Metastable Neon Beam Source Used for Atom Lithography
摘要
研制了一台用于原子光刻的亚稳态氖原子束源,其束流强度可达3.3×1014 atoms/s?Sr..研究了束流强度的变化规律,并对其机理进行了探讨.
Abstract
A neon metastable beam source was built up, from which Neon metastable beam of the intensity of 3.3×10 14 atoms/s·Sr. was generated. The characteristics of the metastable Neon beam were studied, and the corresponding mechanisms are discussed.
霍芸生, 蔡惟泉, 曾庆林, 鄢和明, 王育竹. 原子光刻用亚稳态氖原子束源的研究[J]. 中国激光, 2002, 29(1): 40. 霍芸生, 蔡惟泉, 曾庆林, 鄢和明, 王育竹. Study on Metastable Neon Beam Source Used for Atom Lithography[J]. Chinese Journal of Lasers, 2002, 29(1): 40.
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