激光与光电子学进展, 2004, 41 (6): 35, 网络出版: 2006-06-12
光刻机投影物镜像差的现场测量技术
In-Situ Measurement Methods of Lens Aberrations
光刻 像差 投影物镜 成像质量 泽尼克系数 photolithography aberrations projection lens image quality Zernike coefficients
摘要
为了在光刻机工作过程中保证投影物镜的成像质量,人们开发了一系列投影物镜像差的现场测量技术。对目前国际上常用的几种高精度投影物镜像差现场测量技术进行了分析和比较。
Abstract
In order to control the image quality of the projection lens, a number of in-situ measurement methods of lens aberrations have been developed. Several in-situ high-accuracy measurement methods of lens aberrations are analyzed and compared.
王帆, 王向朝, 马明英, 张冬青, 施伟杰. 光刻机投影物镜像差的现场测量技术[J]. 激光与光电子学进展, 2004, 41(6): 35. 王帆, 王向朝, 马明英, 张冬青, 施伟杰. In-Situ Measurement Methods of Lens Aberrations[J]. Laser & Optoelectronics Progress, 2004, 41(6): 35.
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