强激光与粒子束, 2003, 15 (2): 164, 网络出版: 2006-04-28
双真空烘烤排气台的研制及应用
Design and application of the double-vacuum bake device
摘要
分析了放电管稳定试验前的烘烤排气对等离子体焦点装置试验结果的影响,介绍了双真空烘烤排气台的原理和结构设计,并利用试验数据说明了该排气台在等离子体焦点装置试验中的重要性,在实际应用中具有潜在的实用价值.
Abstract
The influence of the vacuum bake of plasma focus device before discharge experiment on stability and reliability of DPF has been discussed in this paper. The structure, mechanical design and the working principle of the double-vacuum bake device have also been introduced. As a result, the importance of double-vacuum bake of DPF device and the potential application have been shown according to the experimental data.
吴守东, 陈林, 徐敏, 姚斌, 陈雪松. 双真空烘烤排气台的研制及应用[J]. 强激光与粒子束, 2003, 15(2): 164. 吴守东, 陈林, 徐敏, 姚斌, 陈雪松. Design and application of the double-vacuum bake device[J]. High Power Laser and Particle Beams, 2003, 15(2): 164.
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