强激光与粒子束, 2003, 15 (5): 444, 网络出版: 2006-04-28
均匀软X射线多层膜制备方法研究
Study of uniform soft X-ray multilayers deposition technology
摘要
介绍了基于速度调制技术的均匀软X射线多层膜制备方法,并采用该方法在直径为150mm的平面硅基板上制备出Mo/Si多层膜,其中心波长为13.5nm,膜厚空间非均匀性优于1%,较转盘匀速溅射方法制备的多层膜膜厚空间均匀性提高了近6倍.
Abstract
A uniform soft Xray multiplayers deposition technology is introduced in this paper, in which the platter revolution speed is varied as a function of its position relative to the sputtering source. Using this method, the relative thickness variation of the Mo/Si multilayers with central wavelength of 13.5nm was reduced from 7% to 1% peaktovalley over 150mm diameter region on flat Si substrates.
金春水, 林强, 马月英, 裴舒, 曹健林. 均匀软X射线多层膜制备方法研究[J]. 强激光与粒子束, 2003, 15(5): 444. 金春水, 林强, 马月英, 裴舒, 曹健林. Study of uniform soft X-ray multilayers deposition technology[J]. High Power Laser and Particle Beams, 2003, 15(5): 444.