中国激光, 2006, 33 (1): 49, 网络出版: 2006-04-20
激光化学液相次序选择腐蚀新方法
A New Order-Selective Etching Method in Laser Induced Wet-Chemical Etching
激光技术 激光辅助腐蚀 次序选择腐蚀法 光电子 半导体化合物 laser technique laser assisted etching order-selective etching method optical electronic semiconductor compound
摘要
提出了一种激光诱导液相腐蚀新方法——次序选择腐蚀法。次序选择腐蚀是指在激光化学液相腐蚀中,腐蚀溶剂不是混合后同时作用于基片,而是按照溶剂的性能,分先后对基片进行腐蚀。实质上是采用微处理(表面处理)再进行混合液相激光辅助下的腐蚀。理论分析和实验结果都表明,与国内外研究普遍采用的混合溶剂腐蚀法相比,次序选择腐蚀可以有效地提高腐蚀表面的均匀性;因先采用H2O2对基片进行化学腐蚀处理,大大缩短了激光化学腐蚀的时间;利用溶剂分开,降低了激光化学腐蚀对混合溶剂精确配比的要求,使激光化学腐蚀控制和分析更加简单。这种方法可以克服常规方法的诸多弊端,提高腐蚀性能,在特殊结构光电器件和光电集成中具有广泛的应用前景。
Abstract
A new method—laser-assisted wet order-selective-etching is proposed. This method is defined as that the substrate is etched by reagents respectively according to their performance rather than mixed reagents in laser induced wet-chemical etching. Theoretical analysis and experimental results show that compared with the mixed-reagent-etching, this method smoothes the etched surface effectively. Disposing the substrate with H2O2 firstly shortens the time of laser induced wet-chemical etching, and the separation of reagents lowers the requirement of configuration accuracy of the mixed reagent, which simplify the method of controlling and analyzing laser induced wet-chemical etching. For the above reasons, the laser-assisted wet order-selective-etching overcomes disadvantages of conventional ones, improves the laser-etching performance and is of wide use in the fabrication of special-structured opto-electronic devices and the opto-electronic integration.
刘霖, 叶玉堂, 刘娟秀, 赵素英, 范超, 吴云峰, 王昱琳. 激光化学液相次序选择腐蚀新方法[J]. 中国激光, 2006, 33(1): 49. 刘霖, 叶玉堂, 刘娟秀, 赵素英, 范超, 吴云峰, 王昱琳. A New Order-Selective Etching Method in Laser Induced Wet-Chemical Etching[J]. Chinese Journal of Lasers, 2006, 33(1): 49.