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微测热辐射计氧化钒薄膜工艺研究

DEPOSITION PROCESS STUDY OF VANADIUM OXIDE THIN FILMS FOR MICROBOLOMETER

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摘要

用射频磁控反应溅射在石英玻璃和硅片上沉积氧化钒薄膜.利用X射线衍射,X射线光电子谱,原子力显微镜,分光光度计和电阻测量手段对沉积薄膜结构、形貌和性能进行了测试.结果表明,沉积薄膜的电阻温度系数大于1.8%/℃,方块电阻为22±5kΩ/□.

Abstract

Vanadium oxide thin films were deposited onto quartz glass and silicon substrates by radio frequency reactive sputtering methods. The surface morphology, structural features and properties of films were studied by X-ray diffraction(XRD),X-ray photoelectron spectroscopy(XPS), atomic force spectroscopy(AFM), spectrophotometer and resistance measurement methods to ensure the growth of the deposited films. These investigation shown that the deposited thin film has TCR value over 1.8% per degree centigrade and square resistance of 22±5kΩ/□.

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中图分类号:TN21

收稿日期:2002-10-25

修改稿日期:2003-05-16

网络出版日期:2003-12-01

作者单位    点击查看

许旻:兰州大学物理科学技术学院,甘肃,兰州,730000
崔敬忠:兰州物理所,甘肃,兰州,730000
贺德衍:兰州大学物理科学技术学院,甘肃,兰州,730000

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引用该论文

许旻,崔敬忠,贺德衍. DEPOSITION PROCESS STUDY OF VANADIUM OXIDE THIN FILMS FOR MICROBOLOMETER[J]. Journal of Infrared and Millimeter Waves, 2003, 22(6): 419-422

许旻,崔敬忠,贺德衍. 微测热辐射计氧化钒薄膜工艺研究[J]. 红外与毫米波学报, 2003, 22(6): 419-422

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