量子电子学报, 2000, 17 (6): 545, 网络出版: 2006-05-15
钛扩散Nd：LiNbO3波导激光器的1085和815 nm导模和有效折射率的变分分析
Variational Analysis of Guided Mode and Effective Refractive Index at 1085 and 815 nm of Ti-diffused Nd:LiNbO<sub>3</sub>Waveguide Lasers
钛扩散Nd：LiNbO3波导激光器 模场尺寸 有效折射率 单模条件 variational analysis guided mode effective refractive index waveguide laser
摘要
利用变分方法对钛扩散c切Nd：LiNbO3波导激光器的1085和815nmTM导模和有效折射率进行了分析．计算了几个低阶TM模式的模场尺寸和相应的有效折射率随波导制备参数(初始钛条宽度W,扩散温度T和初始钛条厚度H)的变化关系,讨论了波导的单模条件和截止条件．所得理论结果与以前所报导的实验数据进行了比较．
Abstract
An analysis of TM modeand effective refractive index in c-cut Ti-diffused Nd:LiNbO3 strip waveguide lasers hasbeen carried out at the laser wavelength 1085 nm and pump wavelength 815 nm by usingvariational technique. The mode size and effective refractive index as function of thecontrollable waveguide fabrication parameters(initial Ti-strip width W, diffusiontemperature T and initial Ti-strip thickness H) have been calculated for severallower-order modes. The single-mode and cut-off conditions were discussed. The numericalresults are compared with previously published experimental data.
张德龙, 丁桂兰, 陈才和. 钛扩散Nd：LiNbO3波导激光器的1085和815 nm导模和有效折射率的变分分析[J]. 量子电子学报, 2000, 17(6): 545. 张德龙, 丁桂兰, 陈才和. Variational Analysis of Guided Mode and Effective Refractive Index at 1085 and 815 nm of Ti-diffused Nd:LiNbO<sub>3</sub>Waveguide Lasers[J]. Chinese Journal of Quantum Electronics, 2000, 17(6): 545.
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