应用光学, 2005, 26 (6): 63, 网络出版: 2006-06-12  

锗基底7~11.5 μm高性能红外宽带减反射膜的研究

Study on high performance infrared wide-band ( 7~11.5 μm)antireflective film on germanium substrate
作者单位
西安工业学院,光电工程学院,陕西,西安,710032
摘要
为了提高锗基底的透过率和膜层的机械强度,对锗基底上高性能的红外宽带减反射膜的设计与制备工艺进行了研究.介绍了红外宽带减反射膜的膜料选择、膜系设计以及采用离子束辅助沉积该膜系的过程.给出了用该方法制备的7~11.5 μm波段宽带减反射膜的实测光谱曲线,其峰值透过率高达99.5%以上,在设计波段范围内平均透过率大于97.5%,膜层附着性能好,光机性能稳定.这对于红外光学系统的应用具有十分重要的意义.
Abstract
In order to enhance the transmission of germanium and mechanical feature of the antireflective film,the design and preparation of the high performance infrared wide-band antireflective film deposited on germanium substrate by ion-beam assisted deposition are investigated.The selection of film material,the design of film systems and the process of the ion-beam assisted deposition for the film systems are introduced.The measured spectral curves of the antireflection film at 7~11.5μm,deposited by this method,are given.The experimental results show that the peak transmission of the film is more than 99.5%,the average transmission in the designed wavelength range is greater than 97.5%,the film adherency is good,the optical and mechanical properties are stable.These are critical for the application of infrared optical systems.

潘永强, 朱昌, 杭凌侠. 锗基底7~11.5 μm高性能红外宽带减反射膜的研究[J]. 应用光学, 2005, 26(6): 63. 潘永强, 朱昌, 杭凌侠. Study on high performance infrared wide-band ( 7~11.5 μm)antireflective film on germanium substrate[J]. Journal of Applied Optics, 2005, 26(6): 63.

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