应用光学, 2004, 25 (5): 53, 网络出版: 2006-05-19
电子束蒸发TiO2薄膜的光学特性
The Optical Properties of TiO2 Thin Film Prepared by Electron Beam Evaporation
电子束蒸发 TiO2薄膜 折射率 红外吸收光谱 electron beam evaporation tianium dioxide thin film refractive index infrared absorption spectrum
摘要
研究了不同工艺参数条件下，电子束蒸发TiO2薄膜的光学特性。在正交实验的基础上，利用离子束辅助沉积技术，获得了影响TiO2薄膜折射率的主要因素．得到了TiO2薄膜的折射率随氧气分压的关系。对离子氧和分子氧两种情况下TiO2薄膜的折射率进行了比较．得到了TiO2薄膜的折射率与沉积速度的关系，并给出了TiO2薄膜的红外吸收光谱。
Abstract
The optical properties of TiO2 thin film prepared by electron beam evaporation with different craft parameters are studies.On the base of experiments,the main factors of affecting the refractive index of the TiO2 thin film deposition assisted by ion beam have been found out.Function relation of TiO2 refrative index,oxygen pressure and deposition speed have been gained,besides infrared spectrum.Refractive indices of TiO2 thin film deposited in ioned and molecular oxygen are compared.
潘永强, 朱昌, 弥谦, 宋俊杰. 电子束蒸发TiO2薄膜的光学特性[J]. 应用光学, 2004, 25(5): 53. 潘永强, 朱昌, 弥谦, 宋俊杰. The Optical Properties of TiO2 Thin Film Prepared by Electron Beam Evaporation[J]. Journal of Applied Optics, 2004, 25(5): 53.
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