原子与分子物理学报, 2003, 20 (2): 143, 网络出版: 2006-05-19
Diffusion mechanisms in the Fe3Si alloys
Diffusion mechanisms in the Fe3Si alloys
摘要
Abstract
In this paper,the possible reascon for the high thermal vacancy concentration and the low migration barriers for the Fe atorn diffusion in the stoichiometric DO3 structure Fe3Si have been discussed.The high thermal vacancy conenrrarion was attributed to the compression of Fe-Fe atcmic pairs and the tension of Fe-Si atomic pairs in Fe75Si25.The deformations (compression or tensicn)of the atompairs incrcase the interatomic potentials and thus dercrease the enthalpies of vacancy formation.The low minration bamiers for the Fe atom diffusion in Fe75Si25 were related to the symmetric property of the triangualar bamiers.Additionally.it was considered that the Si atoms in Fe3Si could probably migrate via nearest-neighbour jumps without disturbing the long-range order of atomic arrangements,provided that during the diffusion process the residence time on the antistructure sites is very short.
CHEN Yong-chong, ZHANG Yong-gang, WEI Bing-chen, CHEN Chang-qi. Diffusion mechanisms in the Fe3Si alloys[J]. 原子与分子物理学报, 2003, 20(2): 143. CHEN Yong-chong, ZHANG Yong-gang, WEI Bing-chen, CHEN Chang-qi. Diffusion mechanisms in the Fe3Si alloys[J]. Journal of Atomic and Molecular Physics, 2003, 20(2): 143.
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