改变ITO材料通常作为透明导电膜单独使用的状况,将其作为减反射膜系中的一层,能够在很大程度上增加ITO透明导电膜在可见光部分的透过率.通过使用将ITO材料置于膜系的内层和最外层两类不同的设计思想,可以使ITO透明导电膜达到相当优良的应用效果.使用低压反应离子镀方法制备了设计的两类减反射膜系,实验证明,膜层在可见光部分的透过率显著提高,剩余反射率明显下降,并得到了平均透过率为95.83%,最高透过率达到97.26%,方块电阻为13.2～24.6Ω/□的试验结果.

Usually, ITO transparent conductive thin film is made up of only one layer of ITO material with the mean transmittance of nearly 90% in the visible region of the spectrum. The results of using two different new design to produce antireflective film with ITO and deposition them by RLVIP technique are discussed.The mean optical transmittance of thin film of T= 95.83%、the maximum transmittance of T_ max=97.26% and the sheet resistance of R_□=13.2～24.6Ω/□ are achieved by the design in experiments.