采用先进的中频孪生非平衡磁控溅射技术,以金属钨为靶材,制备非晶态WO3电致变色薄膜。用X射线衍射(XRD)、X射线光电子能谱(XPS)、紫外分光光度计等测试手段分析薄膜的结构、表面形貌、成分以及透射光谱特性。研究了氧气流量比及热处理温度对WO3薄膜变色性能的影响。结果表明,中频孪生非平衡磁控溅射技术是制备WO3变色薄膜的一种有效方法;室温条件下沉积获得的原始态薄膜为非晶态WO3;提高氧气流量比和适当热处理温度能有效改善薄膜的电致变色性能。实验中在较高氧气流量比,200 ℃热处理条件下制备的薄膜在380～780 nm的可见光范围内着色态和褪色态平均透光率差值高达50%以上,表现出较好的电致变色性能。

Amorphous WO3 electrochromic films are deposited by advanced mid-frequency dual-target magnetron sputtering method using pure tungsten as targets. X-ray diffraction (XRD), X-ray photoelectronic spectroscopy (XPS) and ultra violet spectrophotometer are used to analyze the structure, morphology, composition and transmittance property of the films respectively. The effects of oxygen flow and heat treatment temperature on the electrochromism of the films are studied. The results show this method is available to deposit electrochromic films. The as-deposited films deposited at room temperature are amorphous. It can improve the electrochromic performance of films to raise oxygen content and keep appropriate heat treatment temperature. In the experiment, films deposited at high oxygen content show favorable electrochromic property after annealing at 200 ℃, and the variation of average transmittance difference between the bleached and colored state reaches 50% in the wavelength range 380～780 nm.