Chinese Optics Letters, 2005, 3 (7): 07425, Published Online: Jun. 6, 2006
Investigation of ultra-short-period W/C multilayers for soft X-ray optics
220.0220 optical design and fabrication 230.0230 optical devices 310.0310 thin films 340.0340 X-ray optics
Abstract
Ultra-short-period W/C multilayers having periodic thickness range of 1.15---3.01 nm have been fabricated for soft X-ray optics using the high vacuum direct current (DC) magnetron sputtering system. These multilayers were characterized by low-angle X-ray diffraction (LAXRD) and transmission electron microscope (TEM). The results show that the multilayer thin films with periodic thickness more than 1.5 nm have clear W-C interface and low roughness. But the structure of the periodic thickness below 1.5 nm is not clear. Finally, three ways to improve the performance of the multilayers are suggested.
Fengli Wang, Zhanshan Wang, Shuji Qin, Wenjuan Wu, Zhong Zhang, Hongchang Wang, Lingyan Chen. Investigation of ultra-short-period W/C multilayers for soft X-ray optics[J]. Chinese Optics Letters, 2005, 3(7): 07425.