对用不同方法制备的软X光激光实验用的Al衰减膜样品，用Auger电子能谱(AES)结合氩离子束刻蚀进行了组分的表面和深度分布分析，结果表明表面氧化层主要由Al2O3组成，氧化达到饱和时的氧化层厚度≈7.5 nm。由于在软X光波段内，氧的吸收系数比铝大一个多数量级，这一氧化层对软X光透过率的影响甚大。将AES测试结果作为参数，使用公式I=I0.exp［-μ(E).(ρd)］对X光透过强度进行修正。同步辐射软X光对样品透过率的直接测量表明，对于透过率大于20%的Al膜，直接测量结果与按修正公式计算的结果在最大偏差11%范围内符合。

Aluminum foils were fabricated by two different methods——evaporation and extrusion moulding. Depth distribution of surface elements and chemical components were analyzed by Auger Electron Spectroscopy (AES). Also the thickness of the oxidation layer exposed in ambient with different times was measured. According to the experimental results, the oxidation layer with saturated oxidation is mainly composed of Al2O3 and its thickness is about 7.5 nm. The throretical transmittance of the foil is then modifed by the formula I=I0.exp［-μ(E).(ρd)］. For comparison, experimental measurements of the transmittance are done on the Beijing synchrotron radiation facility, which are consistent with the throretical value within a maximum difference of 11%.