光学学报, 1999, 19 (1): 113, 网络出版: 2006-08-09
离子束蚀刻微透镜中蚀刻深度允许误差的研究
Acceptable Error of Etching Depth in Ion Beam Etching Microlens
摘要
基于衍射光学原理, 获得了微透镜的衍射效率与蚀刻深度误差之间的关系式。 研究表明, 离子束蚀刻中目前采用的时间控制法可满足L=1时的微透镜微加工要求, 但未能满足L>1时的微透镜微加工要求。 对L>1的情形, 需要提高蚀刻深度控制精度以使蚀刻深度的误差小于87 nm。
Abstract
Based on the diffraction optical principle, a formula of the diffraction efficiency and etching depth error of the microlens is obtained. The results show that the time control method of ion beam etching meets the needs of micro-fabrication of L=1′s microlens and the etching depth error should be smaller than 87 nm in the micro-fabrication of L>1′s microlens.
赵光兴, 陈洪璆, 杨国光. 离子束蚀刻微透镜中蚀刻深度允许误差的研究[J]. 光学学报, 1999, 19(1): 113. 赵光兴, 陈洪璆, 杨国光. Acceptable Error of Etching Depth in Ion Beam Etching Microlens[J]. Acta Optica Sinica, 1999, 19(1): 113.
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