从光学邻近效应产生机理出发, 提出用带灰阶衬线的灰阶掩模实现光学邻近效应精细校正的新方法, 并指出掩模图形振幅信息的优化, 即合理分布掩模图形的空间频谱, 可以改善空间像的光强分布并获得高质量的光刻图样。 计算表明, 校正后的成像图样与理想像的偏差小于0.9%。

Based on analysis of physical mechanism on optical proximity effect, a new method for fine correction of optical proximity effect is presented. The optimum of amplitude distribution on mask can improve distribution of spatial frequency spectrum. So printed image of high fidelity can be obtained. The simulation shows that the deviation between the contour of image after OPC and the contour of ideal image is less than 0.9%.