Chinese Journal of Lasers B, 2001, 10 (5): 333, 网络出版: 2006-08-10  

10 ps High Power Laser System at 248 nm

作者单位
1 Physics Department, Sichuan University, Chengdu 610064, China
2 Northwest Institute of Nuclear Technology, P.O.Box 69-13, Xi’an 710024, China
3 Electrical Engineering Department, University of Maryland, College Park, MD 20742, USA
摘要
Abstract
A simple 10 ps KrF laser system consisting of quenched dye laser oscillator pumped by a XeCl laser, a distributed feedback dye laser (DFDL), a three-stage dye amplifier and a two-stage KrF amplifier are described. The output of the laser system is 140 mJ with 10 ps pulse width by using polarization-multiplexing amplification. A focused output laser intensity of about 4×1015 W/cm2 is obtained. The saturation fluence for KrF laser is obtained with this laser.

YUAN Xiao, YUAN Xiao, DING Guilin, LIU Jingru, LV Baida, Julius Goldhar. 10 ps High Power Laser System at 248 nm[J]. Chinese Journal of Lasers B, 2001, 10(5): 333. YUAN Xiao, YUAN Xiao, DING Guilin, LIU Jingru, LV Baida, Julius Goldhar. [J]. 中国激光(英文版), 2001, 10(5): 333.

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