光学学报, 1997, 17 (6): 745, 网络出版: 2006-10-31
微加工中一种新型刻蚀深度实时检测系统
A Novel Real-Time Etching Depth Testing System for Micro-Fabrication
摘要
实现了一种新型刻蚀深度实时检测系统,整个系统对温度漂移,气体流动与外界振动等环境因素极不敏感,系统测量误差小于0.98%,实现了在真空环境下刻蚀深度的实时监视与检测,对二元光学微加工具有现实意义。
Abstract
A novel real time system for etching depth measurement is demostrated. The system is not sensitive to instability, temperature variation and gaseous flow. The measurement error is small than 0.98%. We realized the real time test of etching depth in vavuum environment. This has practical significance to binary optics micro fabrication.
赵光兴, 陈洪, 候西云, 程上彝, 杨国光. 微加工中一种新型刻蚀深度实时检测系统[J]. 光学学报, 1997, 17(6): 745. 赵光兴, 陈洪, 候西云, 程上彝, 杨国光. A Novel Real-Time Etching Depth Testing System for Micro-Fabrication[J]. Acta Optica Sinica, 1997, 17(6): 745.
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