提出一个软X射线投影光刻、缩比为61、由两非球面镜构成的光学系统。该系统在波长为13 nm时,可获得<30 mm的平像场和优于0.1 μm的光刻线条分辨率,其最大畸变为0.4%。

A two mirror aspheric optical system has been designed for soft X ray reduction lithography. The designed optics achieves a defraction MTF value of over 0.5 at 13 nm wavelength and at a spatial frequency of 5300 lines/mm capable of resolving <0.1 μm lines and spaces within a flat field of φ30 mm. The reduction ratio is 1/6, working F/# is 2.554 and the maximum distortion is 0.04%.