Chinese Optics Letters, 2006, 4 (10): 611, Published Online: Oct. 31, 2006
B4C/Mo/Si high reflectivity multilayer mirror at 30.4 nm Download: 680次
极紫外光学 多层膜 磁控溅射 同步辐射 He-II谱线 230.4170 Multilayers 340.7470 X-ray mirrors 340.6720 Synchrotron radiation
Abstract
The B4C/Mo/Si high reflectivity multilayer mirror was designed for He-II radiation (30.4 nm) using the layer-by-layer method. The theoretical peak reflectivity was up to 38.2% at the incident angle of 5 degrees. The B4C/Mo/Si multilayer was fabricated by direct current magnetron sputtering and measured at the National Synchrotron Radiation Laboratory (NSRL) of China. The experimental reflectivity of the B4C/Mo/Si multilayer at 30.4 nm was about 32.5%. The promising performances of the B4C/Mo/Si multilayer mirror could be used for the construction of solar physics instrumentation.
Zhanshan Wang, Shumin Zhang, Wenjuan Wu, Jingtao Zhu, Hongchang Wang, Cunxia Li, Yao Xu, Fengli Wang, Zhong Zhang, Lingyan Chen, Hongjun Zhou, Tonglin Huo. B4C/Mo/Si high reflectivity multilayer mirror at 30.4 nm[J]. Chinese Optics Letters, 2006, 4(10): 611.