Chinese Optics Letters, 2006, 4 (10): 611, Published Online: Oct. 31, 2006  

B4C/Mo/Si high reflectivity multilayer mirror at 30.4 nm Download: 680次

Author Affiliations
1 Institute of Precision Optical Engineering, Physics Department, Tongji University, Shanghai 200092
2 National Synchrotron Radiation Laboratory, University of Science and Technology of China, Hefei 230029
Abstract
The B4C/Mo/Si high reflectivity multilayer mirror was designed for He-II radiation (30.4 nm) using the layer-by-layer method. The theoretical peak reflectivity was up to 38.2% at the incident angle of 5 degrees. The B4C/Mo/Si multilayer was fabricated by direct current magnetron sputtering and measured at the National Synchrotron Radiation Laboratory (NSRL) of China. The experimental reflectivity of the B4C/Mo/Si multilayer at 30.4 nm was about 32.5%. The promising performances of the B4C/Mo/Si multilayer mirror could be used for the construction of solar physics instrumentation.

Zhanshan Wang, Shumin Zhang, Wenjuan Wu, Jingtao Zhu, Hongchang Wang, Cunxia Li, Yao Xu, Fengli Wang, Zhong Zhang, Lingyan Chen, Hongjun Zhou, Tonglin Huo. B4C/Mo/Si high reflectivity multilayer mirror at 30.4 nm[J]. Chinese Optics Letters, 2006, 4(10): 611.

关于本站 Cookie 的使用提示

中国光学期刊网使用基于 cookie 的技术来更好地为您提供各项服务,点击此处了解我们的隐私策略。 如您需继续使用本网站,请您授权我们使用本地 cookie 来保存部分信息。
全站搜索
您最值得信赖的光电行业旗舰网络服务平台!