光学学报, 1996, 16 (10): 1379, 网络出版: 2006-12-04
XeCl准分子激光光束均匀器及其应用
Beam Homogenizer for XeCl Excimer Laser and Its Applications
摘要
采用光束均匀器,改善XeCl准分子激光器输出光束强度的分布,其起伏优于2%,用这一装置测量了C60薄膜的刻蚀阈值,并完成了准分子激光改变C60薄膜电导率的实验研究。
Abstract
A beam homogenizer was used to improve the intensity distribution of the output beam from XeCl excimer laser. The results demonstrated that the irradiation uniformity was better than 2%. Using this apparatus, the etch threshold of solid thin film was measured and excimer laser induced electrical conductivity in C 60 thin film has been studied experimentally.
高鸿奕, 楼祺洪, 董景星, 宁东, 魏运荣, 叶震寰. XeCl准分子激光光束均匀器及其应用[J]. 光学学报, 1996, 16(10): 1379. 高鸿奕, 楼祺洪, 董景星, 宁东, 魏运荣, 叶震寰. Beam Homogenizer for XeCl Excimer Laser and Its Applications[J]. Acta Optica Sinica, 1996, 16(10): 1379.