中国激光, 1996, 23 (9): 801, 网络出版: 2006-12-04
薄Si膜对基底表面粗糙度的影响
The Roughness of the Very Thin Si Films
摘要
利用ZYGO光学干涉测量仪,散射积分测量法观测了光学元件表面均方根粗糙度.详细分析了薄Si膜对基底均方根粗糙度的影响,由此认为薄膜并不总是复制基底表面的粗糙度,结果出现了薄膜降低表面粗糙度的现象,提出了一定厚度范围的薄Si膜的表面粗糙度存在着一个稳定值的新设想。
Abstract
The surface roughness of the very thin Si films deposited on the K9 glass and thesilicon wafer using planar magnetron sputtering has ben measured by ZYGO and scatteringmethods. A saturated value of the roughness of the very thin Si films on the K9 glass isillustrated.
邵建达, 范正修, 易葵, 王润文. 薄Si膜对基底表面粗糙度的影响[J]. 中国激光, 1996, 23(9): 801. 邵建达, 范正修, 易葵, 王润文. The Roughness of the Very Thin Si Films[J]. Chinese Journal of Lasers, 1996, 23(9): 801.
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