利用两种聚合物合成改性手段制备了纳米颗粒SiO2掺杂PMMA溶胶,并采用旋涂法甩膜制得PMMA改性聚合物薄膜。通过分析薄膜样品在红外和可见光波长范围内的光损耗特性,优化了制备工艺,使其在提高热稳定性的同时能保证优良的光学性能。另外,还测试分析了改性PMMA薄膜在不同紫外光照条件下折射率和厚度的变化,从宏观现象与微观结构之间的关系及作用机理的角度进行了深入的理论分析。

PMMA sol sophisticated with nano-silicon dioxide, by two kinds of compound modification processes, was used to fabricate modified polymer films under different spinning conditions. The fabrication technique was optimized according to the analysis results of their optical loss in infrared and visible light wavelength ranges. The sample shows excellent optical properties and thermal stability. In addition, the changes of refractive index and thickness under ultraviolet illumination with different conditions were studied in detail. Deep analysis was done on the relationship between macroscopical phenomena and microstructures.