为了研究特定模式下氟化物高反射薄膜的损伤机理, 采用相衬微分干涉显微镜、原子力显微镜和台阶仪对不同工艺条件下制备薄膜的损伤区域逐步进行对比分析, 在薄膜沉积温度增加后, 随着薄膜体内聚集密度的增加, 薄膜激光损伤阈值有所提升; 对于规整膜系, 体内驻波电场强度分布对薄膜损伤也有较大影响。结果表明, 根据薄膜损伤形貌和损伤深度综合推断, 制备的高反射薄膜损伤是由薄膜体内的聚集密度和电场强度分布所共同引起。该实验结果为下一步继续研究高性能激光反射薄膜打下了基础。

In order to study the damage mechanism of high reflective fluoride film under a certain condition, the damaged areas of the films made with the different processing techniques were analyzed by means of differential interference contrast microscopy, atomic force microscopy and optical profiler. With the increase of the film deposition temperature and the packing density of the film in vivo, laser induced damage threshold of film is improved. For the regular film series, a standing wave electric field intensity distribution of the standing wave in vivo has the greater impact on the film damage. The results show that the damage of high-reflection film is jointly caused by packing density of the film in vivo and electric field intensity distribution based on the damage morphology and damage depth of the film. The results provide the foundation for further research of high quality of laser reflective coatings.