Chinese Journal of Lasers B, 1994, 3 (1): 69, 网络出版: 2007-08-17
Fabrication and Thickness Measurment of the Thin Films Deposited by Planar Magnetron Sputtering
Fabrication and Thickness Measurment of the Thin Films Deposited by Planar Magnetron Sputtering
摘要
Abstract
Reported here is a new method, low angle x -ray diffraction, of investigation theminimal thickness of thin films for various materials, and those of W, C, Mo, Si thin films deposited by planar magnetron sputering have been presented.
SHAO Jian-da, FAN Zheng-xiu, YI Kui, YIN Gong-jie, YUAN Lixiang. Fabrication and Thickness Measurment of the Thin Films Deposited by Planar Magnetron Sputtering[J]. Chinese Journal of Lasers B, 1994, 3(1): 69. SHAO Jian-da, FAN Zheng-xiu, YI Kui, YIN Gong-jie, YUAN Lixiang. Fabrication and Thickness Measurment of the Thin Films Deposited by Planar Magnetron Sputtering[J]. 中国激光(英文版), 1994, 3(1): 69.
PDF全文
