光学学报, 1995, 15 (7): 909, 网络出版: 2007-08-17
308 nm准分子激光对C60薄膜的刻蚀特性研究
Ablation Characteristics of C60Face by 308 nm Excimer Laser
摘要
测量在空气和真空中308 nm准分子激光对C60薄膜的刻蚀速率和刻蚀阈值,讨论了环境中氧气对刻蚀特性的影响。
Abstract
The ablation rate and etch threshold of the C60 film are measured by using 308urn excimer laser.The effect of O2gas on the ablation characteristics are discussed.
宁东, 楼祺洪, 叶震寰, 高鸿奕, 董景星, 魏运荣, 向世清. 308 nm准分子激光对C60薄膜的刻蚀特性研究[J]. 光学学报, 1995, 15(7): 909. 宁东, 楼祺洪, 叶震寰, 高鸿奕, 董景星, 魏运荣, 向世清. Ablation Characteristics of C60Face by 308 nm Excimer Laser[J]. Acta Optica Sinica, 1995, 15(7): 909.