光学学报, 1995, 15 (7): 913, 网络出版: 2007-08-17
PECVD SiON薄膜的工艺控制、性质及其潜在应用
The Teclmology Control and Properties of PECVD SiON Filmsand Its Potential Applications
光波导 光互连 等离子增强化学气相淀积 optical waveguide optical interconnection plasma-enhanced chemicalvapor deposition
摘要
研究了等离子增强化学气相淀积(PECVD)氢氧化硅(SiON)薄膜的工艺控制、性质以及薄膜波导在超大规模集成电路(VLSI)光互连中的潜在应用。
Abstract
The technology control, structure and properties of PECVD SiON films and thepotential applications of thih film waveguides in optical interconnections for VLSI arediscussed in this peper.
祖继锋, 耿完桢, 洪晶, 余宽豪, 江志庚, 李志彭, 陈学良. PECVD SiON薄膜的工艺控制、性质及其潜在应用[J]. 光学学报, 1995, 15(7): 913. 祖继锋, 耿完桢, 洪晶, 余宽豪, 江志庚, 李志彭, 陈学良. The Teclmology Control and Properties of PECVD SiON Filmsand Its Potential Applications[J]. Acta Optica Sinica, 1995, 15(7): 913.
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