为了对光掩模版亮场缺陷进行修补，采用激光化学气相沉积的方法，利用功率密度为1．3×10⁸W／cm²的355nm紫外激光诱导Cr(CO)₆分解，在1．5s内获得了光掩模亮场区域附着力强、消光比高的金属Cr膜。结果表明，在开放的环境下，采用高功率密度、短作用时间的方法能够得到高质量的沉积薄膜，满足了微电子行业中对掩模版修复的要求。

In order to repair the clear defects of photomask,a 355nm UV laser with the intensity of 1.3×10⁸W/cm² is used to induce hexacarbonyls chrome photolysis in the open air,and get the Cr film with good adhesion and extinction on transparent substrate. Results show that,in the open air,the method with high intensity and short radiation time can get high quality film.