Chinese Optics Letters, 2007, 5 (12): 703, Published Online: Dec. 12, 2007
Fabrication of SiO2 microdisk optical resonator Download: 564次
微结构制作 谐振腔 量子电动力学 140.4780 Optical resonators 230.4000 Microstructure fabrication 230.5750 Resonators 270.5580 Quantum electrodynamics
Abstract
The silica microdisk optical resonator which exhibits whispering-gallery-type modes with quality factors of 9.67*10^(4) is fabricated with photolithographic techniques. Reactive ion beam etching (RIBE) is used to get the silica disks with photoresist masks on SiO2/Si made by standard ultraviolet (UV) photolithography, and spontaneous silicon etching by XeF2 is used to fabricate the silicon micropillars. This fabrication process can control the microcavity geometry, leading to high experiment repeatability and controllable cavity modes. These characteristics are important for many applications in which the microcavity is necessary, such as the quantum gate.
Wei Wei, Xiaowei Wu, Shaojun Fu, Yong Wang, Yuanji Pei, Yunfeng Xiao, Zhengfu Han. Fabrication of SiO2 microdisk optical resonator[J]. Chinese Optics Letters, 2007, 5(12): 703.