脉冲激光沉积(PLD)技术制备类金刚石(DLC)薄膜存在着金刚石相含量较低、石墨颗粒多、薄膜与衬底附着力差、膜内应力大等技术难题,为此,研究人员研究出了多种技术措施,如通过引入背景气体、超快激光、偏压、磁场以及加热等措施提高了薄膜金刚石相含量;采用金刚石或丙酮靶材、减小单脉冲能量等措施减少了石墨颗粒;采用间歇沉积、真空退火、超快激光等措施减少了膜内应力;合理设计过渡层改善了膜与衬底间的附着力等。这些技术有力地推动了脉冲激光沉积技术的发展。

There are many technical problems in pulsed laser deposition(PLD) of diamond-like carbon(DLC) films, such as low diamond content, too much graphite macroparticles, poor adhesion between film and substrate, high inner stress in film and so on. Many techniques have been developed to conquer the above prololems, for example, the diamond content is improved by background gas, ultrafast laser, bias, magnetic field, heat up; graphite macroparticles is decreased by diamond or acetone substrate, reduced laser pulse energy; inner stress in film is decreased by intermissive deposition, anneal in vacuum, ultrafast laser; adhesion between film and substrate is improved by proper interlayers. These techniques promote the development of PLD efficiently.