针对二极式场致发射显示器(field emission display, FED)驱动电压过高的问题, 设计制作了前栅极式三极结构纳米ZnO场致发射显示器, 并进行了场致发射实验, 验证这种结构的可行性。前栅极结构采用喷砂工艺结合光刻技术, 制作出微细的栅孔结构, 实现了较低电压的控制。同时对影响场致发射性能的栅极电压、栅孔开口尺寸和介质层厚度进行了分析讨论。实验结果表明：采用三极结构四针状纳米ZnO场致发射显示器具有良好的发射性能, 是一种有前途的场致发射显示器。

The diode field emission display (FED) has high driving voltage, which brings trouble to driving circuit. In order to solve this problem, we design normal grid triode structure tetrapod-like nano-ZnO FED. The field emission property is investigated. The results show that the structure is feasible. With abrasive blasting and lithographic technology, grid apertures of the normal grid structure have been created, and low voltage control is achieved. The grid voltage, the gate apertures size and the thickness of medium layer parameters which influence the performance of triode FED have been analyzed. The experimental results show that normal gate triode-structure tetrapod-like nano-ZnO FED has well electron emission performance and it is also a potential field emission display.