Chinese Optics Letters, 2009, 7 (4): 04325, Published Online: Apr. 27, 2009
Deep silicon grating as high-extinction-ratio polarizing beam splitter Download: 652次
050.1950 Diffraction gratings 230.1360 Beam splitters 230.5440 Polarization-selective devices 060.4510 Optical communications
Abstract
A deep binary silicon grating as high-extinction-ratio reflective polarizing beam splitter (PBS) at the wavelength of 1550 nm is presented. The design is based on the phenomenon of total internal reflection (TIR) by using the rigorous coupled wave analysis (RCWA). The extinction ratio of the rectangular PBS grating can reach 2.5\times10^5 with the optimum grating period of 397 nm and groove depth of 1.092 \mum. The efficiencies of TM-polarized wave in the 0th order and TE-polarized wave in the -1st order can both reach unity at the Littrow angle. Holographic recording technology and inductively coupled plasma (ICP) etching could be used to fabricate the silicon PBS grating.
Jijun Feng, Changhe Zhou, Bo Wang, Jiangjun Zheng. Deep silicon grating as high-extinction-ratio polarizing beam splitter[J]. Chinese Optics Letters, 2009, 7(4): 04325.