Chinese Optics Letters, 2009, 7 (7): 07601, Published Online: Jul. 24, 2009
Analysis of laser induced thermal mechanical relationship of HfO2/SiO2 high reflective optical thin film at 1064 nm 
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Abstract
A numerical model is developed for the calculation of transient temperature field of thin film coating induced by a long-pulsed high power laser beam. The electric field intensity distribution of HfO2/SiO2 high reflective (HR) film is investigated to calculate the thermal field of the film. The thermal-mechanical relationships are discussed to predict the laser damage area of optical thin film under long pulse high energy laser irradiation.
Gang Dai, Yanbei Chen, Jian Lu, Zhonghua Shen, Xiaowu Ni. Analysis of laser induced thermal mechanical relationship of HfO2/SiO2 high reflective optical thin film at 1064 nm[J]. Chinese Optics Letters, 2009, 7(7): 07601.
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