为了实现对纳米级薄膜的快速测量，运用了基于分振幅斯托克斯参量测量的椭偏测厚的方法，对该方法中的原理、计算和参量测量方法进行研究，并构建了实验系统。首先，设计了一个光路在同一平面上的分振幅斯托克斯参量测量装置，用偏振片和1/4 波片组合产生已知的偏振态来定标该装置，用4 个性能一致的光电探测器实现快速测量光束的斯托克斯参量。然后用实验系统测量纳米级薄膜样品的入射和反射偏振光的斯托克斯参量，求得椭偏参量ψ 和Δ，再求得薄膜样品的厚度d 和折射率n。讨论了斯托克斯参量测量的误差问题，最后与常用的消光法椭偏仪作了对比测量实验。测量结果与椭偏消光法比较，d 和n 的相关系数均大于85％，说明两仪器有很好的一致性。实验研究表明，该方法通过测量入射光和反射光的偏振态，能快速测量纳米级薄膜的参数。系统构建容易，调节方便，定标简单。

In order to test the nanometer films fast, a method of ellipsometry based on Stokes parameters with a Division-of-amplitude Polarimeter (DOAP) was introduced. The structure of instrument, theoretical calculation and parameters testing were investigated. Firstly, a DOAP was designed, in which the light path was in the same plane. This was calibrated by known polarization that combined a polarizer with one quarter-wave plate. Then, the Stokes parameters could be tested quickly by use of four photoelectric detectors with the same properties. Secondly, the ellipsometric parameters (ψ, Δ) of a nanometer film were worked out by testing the Stokes parameters of incidence and reflection light on a sample with the DOAP. Then, the thickness and refractive index of the sample were obtained. The testing error of Stokes parameters was discussed. Finally, the parallel experiment with an ellipsometer in extinction was done. The experiment shows that the related coefficient of the thickness and refractive index are greater than 85% and consistency of two instruments is good. With the conclusion, the nanometer films can be measured fast by testing the polarized states of incidence and reflection light, and the DOAP can be set up easily, adjusted conveniently and calibrated simply.