在满足工艺要求的前提下,通过模拟光栅衍射,设计出镂空透射光栅模型,在此基础上将电子束和X射线光刻技术相结合,研究了制造2000 l /mm X射线镂空透射光栅的新工艺技术。首先利用电子束光刻和微电镀技术在镂空聚酰亚胺薄膜底衬上制备X射线母光栅掩模,然后利用X射线光刻和微电镀技术实现了光栅图形的复制,之后采用紫外光刻和微电镀技术制作加强筋结构,最后通过腐蚀体硅和等离子体刻蚀聚酰亚胺完成镂空透射光栅的制作。从此新的制造工艺结果上来看,制备的光栅栅线平滑,占空比合理,侧壁陡直,不同光栅之间一致性好,完全可以满足应用需求,充分表明了该制造技术是透射式X射线衍射光学元件制造的良好选择。

Within the limit of fabricating techniques,2000 l /mm self-standing transmission gratings model was designed. And by combining the techniques of electronic-beam lithography and X-ray lithography,the 2000 l /mm X-ray self-standing transmission gratings was fabricated. Firstly,the electronic-beam lithography and micro-electroplating technology was used to prepare a master mask of gratings on polyimide membrane substrate. Then by using X-ray lithography and micro-electroplating,child gratings was replicated on the master mask. And the self-standing graph was transferred to the daughter gratings via utraviolet (U-V) lithography and micro-electroplating. Finally,with the technology of etching and inductively coupled plasma (ICP),the fabrication of X-ray self-standing transmission gratings was fulfilled. From the fabrication results of the gratings,it shows that bars smoothness,the absent ratio and the profile of the gratings are all desired.