研究了高功率激光装置光路中的分子级污染程度。采用专用空气采样动力设备及吸附管,在一定时间内对光路中的空气进行采样并作痕量分析后,得出了卤素、含硫化合物、可溶性胺类和氨、碳氢化合物 (C6～C16有机物) 4类物质在打靶前后的数密度变化。结果显示:除含硫化合物外,其余3种物质数密度超过了美国NIF标准的上限,其中氨和可溶性胺类、碳氢化合物的数密度超过较多;卤素、含硫化合物、氨和可溶性胺类的数密度在打靶后比打靶前有所降低,而碳氢化合物的数密度在打靶后比打靶前有所升高。结果表明在该装置中存在比较严重的气载分子污染物污染。分析了气载分子污染物数密度变化的原因以及可能的产生源,并对如何去除这些气载分子污染物提出了建议。

Airborne molecular contaminations inside a high power laser facility are studied.Air samples of suspected locations are collected by special air-sampling facilities before and after laser launch.Extraction and concentration measurement of the main airborne molecules,including halogens,sulphur compounds,ammonia and soluble amines and hydrocarbons (C6～C16) are made during the sampling progress.The trace analysis suggests that the concentrations of most species except sulphur compounds,especially ammonia,soluble amines and hydrocarbons,exceed the suggested upper control limit of US NIF reference.The concentrations of halogens,sulphur compounds,ammonia and soluble amines after laser launch are lower than that before launch while the concentrations of hydrocarbons after launch is higher.It is demonstrated that severe airborne molecular contaminants exist in this laser facility.The difference between target and control groups is studied and explained.In addition,the source of typical airborne molecular contaminants is discussed and the removal methods are suggested.