中国激光, 2015, 42 (8): 0807002, 网络出版: 2022-09-24   

飞秒激光溅射沉积法制备碳薄膜

Carbon Film Fabricated by Femtosecond Pulse Laser Deposition
作者单位
北京工业大学激光工程研究院, 强场与超快光子实验室, 北京 100124
摘要
在气压为1.33×10-4 Pa 和衬底温度为室温条件下,利用飞秒激光剥落石墨的方法在无催化层的硅(Si)衬底上加工碳纳米薄膜;探究了激光能量和沉积时间对碳纳米薄膜成膜情况的影响。通过拉曼光谱对碳纳米薄膜表面物质的组成进行了分析;利用扫描电镜(SEM)和原子力显微镜(AFM)来显示薄膜的表面结构;实验结果显示,辐照时间对ID/IG 的比值以及碳晶粒的大小都有显著的影响,并且高能量的飞秒激光脉冲能够促进碳晶粒的结晶。同时,在高能量的激光脉冲下沉积碳纳米薄膜,在Si表面发现了特殊图案的碳纳米结构:雪花状,方块状及四角星状。
Abstract
The films of nanoscale-carbonare is formed through laser exfoliation of graphite on the substrate silicon (Si) without a catalytic layer and the chamber is vacuumed to 1.33×10-4 Pa in the growth process. The femtosecond (fs) laser exfoliation process is investigated at different laser fluences and deposition time. The composition of the carbon films deposited at different pulse energies and irradiation time are detected by the visible Raman spectroscopy. Scanning electron microscope (SEM) and atomic force microscope are used to display the surface of the thin films. The results show that the deposition time influences ratio of ID/IG, microstructure, the grain size of the carbon. High-intensity femtosecond laser pulse energy can promote the crystallization of carbon particles. Some special particles (pattern-snowflake-like,cube and quadrangle), which are formed by femtosecond laser pulse ablates a graphite at a high laser fluence, particles are found on the sample surface.

董祥明, 刘世炳, 宋海英. 飞秒激光溅射沉积法制备碳薄膜[J]. 中国激光, 2015, 42(8): 0807002. Dong Xiangming, Liu Shibing, Song Haiying. Carbon Film Fabricated by Femtosecond Pulse Laser Deposition[J]. Chinese Journal of Lasers, 2015, 42(8): 0807002.

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