根据红外上转换材料测试实验系统的使用要求，选择Ta2O5和SiO2作为高低折射率膜料，通过椭偏仪测试膜料色散代入膜系软件进行设计优化，采用电子枪蒸镀的物理沉积技术，同时利用霍尔离子源辅助沉积提高膜料折射率，并通过调整工艺参数和改进光学监控方法解决了误差在监控波长处的累积问题，成功在石英基底上制备了干涉截止滤光片。镀膜后的石英基片在808、980、1064 nm 波长处透射率小于0.01%，可见光波段的平均透射率大于90%。结果表明该干涉截止滤光片的镀制满足上转换实验系统的使用要求。

According to the requirement of testing system for infrared up-conversion materials, Ta2O5 and SiO2 are chosen as high and low refractive index materials. The film system is designed and optimized by film software after testing the dispersive curve of the materials by spectroscopic ellipsometer. The edge filter is prepared on the quartz substrate through electron-beam evaporation system, and the end-Hall ion source assisted deposition is used to improve the refractive index of the materials. By adjusting parameters of the filter and improving optical controlled method, the error accumulation of thickness at the monitor wavelengths is solved. The transmittance of the films at 808、980 and 1064 nm wavelengths are less than 0.01%, and the average transmission is over than 90% at visible band. The test results show that the edge filter meets the requirements of the testing system for infrared up-conversion materials.