Chinese Optics Letters, 2010, 8 (1): 99, Published Online: Mar. 1, 2010
Fabrication and measurement of optical characterization of one dimensional photonic crystal with defect Download: 533次
光子晶体 缺陷模 光子带隙 刻蚀 220.0220 Optical design and fabrication 260.0260 Physical optics 310.0310 Thin films
Abstract
Numerical calculations based on the transfer matrix method are carried out, and the results of band gap with resonance peaks are obtained. The electron beam lithography technology (EBL) and induction coupling plasma (ICP) etching are used to make the photonic crystal (PC) structures, and from several scanning electron microscope images, the PC structures are observed with features closing to the design. In order to create the tiny PC structures in the right places of the waveguide by the EBL technology at different time, some alignment markers are deposited on the chip, which are made of gold that deposited on titanium for its good adhesion to the underlying Si. An optical testing bed is designed for measurement of the optical characterization of PC structures. Through the analysis of the measured data, \Delta \lambda value of 0.8 nm is obtained and for the centre frequency of 1547 nm, a very high quality factor value of 1933 can be obtained. The 3-nm difference represents only a 0.2% error from the theoretical centre.
Kai Tong, Fei Wu, Zhibin Wang. Fabrication and measurement of optical characterization of one dimensional photonic crystal with defect[J]. Chinese Optics Letters, 2010, 8(1): 99.