阐述了一种在掺锆杂化薄膜上获得分布反馈结构的软刻蚀制备方法，该薄膜采用可紫外光交联的溶胶凝胶(sol-gel)法制得。采用全息双光束干涉方法制备一维光栅母版，并将聚二甲基硅氧烷(PDMS)预聚物浇铸在光栅母版上，加热固化后发生交联反应可以得到弹性体印章。采用旋转涂覆的方法在玻璃基片上制备掺锆的杂化薄膜后，并将弹性体印章覆盖在掺锆的杂化薄膜上，再分别经过预热处理、紫外光照和后热处理，揭起后即可在薄膜上获得分布反馈式结构。使用原子力显微镜(AFM)和扫描电镜(SEM)分别对光栅母版，PDMS印章以及复制获得的掺锆的溶胶凝胶上的分布反馈结构进行了分析研究，研究发现光栅母版的微结构成功复制到掺锆的溶胶凝胶薄膜的表面，并具有相同的周期结构。

A new method of fabricating distributed feedback structure on photo-curable zirconia-doped sol-gel, using a polydimethylsiloxane (PDMS) mold through a soft lithographic approach, was proposed. The master structure is one-dimensional grating in photoresist by exposing to two interfering laser beams. Zirconia-doped sol-gel films on glass substrates were formed by spin-coating. By virtue of the conformal contact between the elastomeric mold and the zirconia-doped sol-gel, the surface relief structures were facilely patterned on the zirconia-doped sol-gel by subsequently pre-baking, ultraviolet (UV) irradiating and post-baking procedures. The master structures, the elastomer mold and the replicated structure were examined using an atomic force microscope (AFM) and a scanning electron microscope (SEM).