对利用X 射线光刻制作大高宽比硬X 射线波带片的设计和制作工艺进行了研究。采用电子束光刻制作X射线光刻掩模,并利用X 射线光刻制作最终的硬X 射线波带片。采用对光刻胶结构加入支撑点的方法,大大提高了X 射线光刻制作硬X 射线波带片的高宽比。对所加入支撑点的布置策略进行了优化,使得支撑点所占的面积比例减小。所制作的波带片最外环宽度为200 nm,厚度为2.8 μm,具有优良的结构质量,预期可用于10 keV 到25 keV波段,并具有优于250 nm 的成像分辨率。

The design and fabrication of high aspect-ratio hard X-ray zone plates by X-ray lithography are studied. The X-ray lithography mask was fabricated by electron beam lithography, and the final hard X-ray zone plates were fabricated by X-ray lithography. By integrating supporting points into the photoresist structure, the high aspect ratio of hard X-ray zone plates fabricated by X-ray lithography was greatly increased. The arrangement strategy of added supporting points was optimized to reduce the area ratio taken by the supporting points. High quality zone plates were achieved with an outermost zone width of 200 nm and a thickness of 2.8 μm. The fabricated zone plates can be used for 10 to 25 keV hard X-rays, and imaging resolution better than 250 nm can be expected.