为了进一步研究13.9 nm类镍银和19.6 nm类氖锗X射线激光,制备了工作在上述两个波长的Mo/Si多层膜反射镜。设计了结构简单、操作方便的小型反射率计,将其安装在Mcpherson247单色仪出射狭缝附近,以铜靶激光等离子体辐射源为极紫外光源,组建了一套适合反射率测量的实验装置,利用此装置测量了实验室制备的多层膜反射镜的反射率。测量之前对单色仪进行了标定并对光源稳定性进行了测量,结果显示,波长准确度是0.08 nm,光源信号抖动范围<5%,光源稳定性好。反射率测量结果显示,实验室能够制备出中心波长分别是13.91和19.60 nm的Mo/Si多层膜反射镜,相应反射率分别为41.9%和22.6%,半宽度为0.56和1.70 nm。同时还用WYKO测量得到13.9和19.6 nm Mo/Si多层膜的表面粗糙度分别为0.52和0.55 nm。

To satisfy the requirements of 13.9 nm Ni-like Ag and 19.6 nm Ne-like Ge X-ray laser researches,Mo/Si multilayer mirrors were prepared,and a small and simple structure reflectometer easy to operation was designed.A reflectivity-measuring system consisting of a reflectometer,a Mcpherson 247 monochromator and a Extreme Ultraviolet(EUV)radiation source from copper-target Laser Produced Plasmas(LPP) was established.The calibration precision of the monochromator was 0.08 nm and the intensity variance of the LLP source was lower than 5%.The experimental results show that the reflectivities of Mo/Si multilayer mirror at 13.9 and 19.6 nm are 41.9% and 22.6%,the related FWHMs are 0.56 and 1.70 nm,respectively.The measurement of surface roughness was carried out using WYKO,which are 0.52 nm for 13.9 and 0.55 nm for 19.6 nm.